US 12,038,591 B2
Polymer patterned disk stack manufacturing
Ling Li, Cedar Park, TX (US); Chieh Chang, Cedar Park, TX (US); Sharad D. Bhagat, Austin, TX (US); Christophe Peroz, San Francisco, CA (US); Brian George Hill, Duxbury, MA (US); Roy Matthew Patterson, Hutto, TX (US); and Satish Sadam, Round Rock, TX (US)
Assigned to Magic Leap, Inc., Plantation, FL (US)
Filed by Magic Leap, Inc., Plantation, FL (US)
Filed on Jun. 23, 2020, as Appl. No. 16/909,760.
Claims priority of provisional application 62/892,427, filed on Aug. 27, 2019.
Claims priority of provisional application 62/865,715, filed on Jun. 24, 2019.
Prior Publication US 2020/0402871 A1, Dec. 24, 2020
Int. Cl. B29C 39/02 (2006.01); G02B 3/00 (2006.01); G02B 27/42 (2006.01)
CPC G02B 3/0062 (2013.01) [B29C 39/026 (2013.01); G02B 27/4272 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A method of aligning a stencil to an eyepiece wafer, the method comprising:
providing the stencil;
positioning the stencil with respect to a first light source;
determining locations of at least two stencil apertures;
providing the eyepiece wafer, wherein the eyepiece wafer includes at least two eyepiece waveguides, each eyepiece waveguide including an incoupling grating and a corresponding diffraction pattern;
directing light from one or more second light sources to impinge on each of the corresponding diffraction patterns and propagate through each corresponding eyepiece waveguide by total internal reflection;
imaging light diffracted from each incoupling grating;
determining at least two incoupling grating locations;
determining offsets between corresponding stencil aperture locations and incoupling grating locations; and
aligning the stencil to the eyepiece wafer based on the determined offsets.