US 12,038,476 B2
Systems, devices, and methods for performing a non-contact electrical measurement on a cell, non-contact electrical measurement cell vehicle, chip, wafer, die, or logic block
Indranil De, Alameda, CA (US); Marian Mankos, San Jose, CA (US); Dennis Ciplickas, San Jose, CA (US); Christopher Hess, Belmont, CA (US); Jeremy Cheng, San Jose, CA (US); Balasubramanian Murugan, San Ramon, CA (US); and Qi Hu, Cypress, CA (US)
Assigned to PDF SOLUTIONS, INC., Santa Clara, CA (US)
Filed by PDF SOLUTIONS, INC., Santa Clara, CA (US)
Filed on May 5, 2023, as Appl. No. 18/144,146.
Application 18/144,146 is a continuation of application No. 17/750,405, filed on May 23, 2022, granted, now 11,668,746.
Application 17/750,405 is a continuation of application No. 17/061,352, filed on Oct. 1, 2020, granted, now 11,340,293, issued on May 24, 2022.
Claims priority of provisional application 62/945,553, filed on Dec. 9, 2019.
Claims priority of provisional application 62/909,141, filed on Oct. 1, 2019.
Prior Publication US 2023/0358804 A1, Nov. 9, 2023
Int. Cl. G01R 31/306 (2006.01); G01R 31/265 (2006.01); G01R 31/302 (2006.01)
CPC G01R 31/306 (2013.01) [G01R 31/2653 (2013.01); G01R 31/3025 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A method comprising:
receiving a recipe for a die included in a wafer, the die being divided into a plurality of tiles, each tile including a registration area and a plurality of non-contact electronic measurement (NCEM)-enabled cells, the recipe including a position for the die within the wafer, a position of the registration area, and a position for each of the NCEM-enabled cell of the plurality of NCEM-enabled cells;
determining an expected position of a registration area included in a tile of the plurality of tiles using the recipe, the wafer being positioned on a movable stage;
determining a parameter of motion of the movable stage using the expected position of the registration area; and
instructing an electron beam column to scan a region of the tile corresponding to the expected position of the registration area using an electron beam while the stage is moving in accordance with the determined parameter.