| CPC H01L 21/7684 (2013.01) [B24B 37/044 (2013.01); B24B 37/20 (2013.01); B24B 37/24 (2013.01); B24B 53/017 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01)] | 15 Claims |
|
1. A polishing pad after application of a polishing composition thereto and during polishing, comprising:
a polishing layer; and
a particulate layer comprising particles of a polishing composition being stably present on a polishing surface of the polishing layer,
wherein the polishing composition is selected from the group consisting of a first composition having a hydrogen ion concentration (pH) of 8 to 12, a second composition having a hydrogen ion concentration (pH) of 2 to 6, and a third composition including ceria particles and having a hydrogen ion concentration (pH) of 7.5 to 9.5,
wherein when polishing is carried out using the first composition of the polishing composition having the hydrogen ion concentration (pH) of 8 to 12, the polishing surface of the polishing layer has a first surface zeta potential (PZ1), which is a value associated with suspended particles in the first composition separated from the particulate layer by a first slipping plane present during the polishing and derived by the following Relationship 1 for the first composition;
when polishing is carried out using the second composition of the polishing composition having the hydrogen ion concentration (pH) of 2 to 6, the polishing surface of the polishing layer has a second surface zeta potential (PZ2), which is a value associated with the suspended particles in the second composition separated from the particulate layer by a second slipping plane present during the polishing and derived by the following Relationship 1 for the second composition; and
the first surface zeta potential (PZ1) and the second surface zeta potential (PZ2) satisfy the following Relationship 2:
Surface zeta potential=(−) zeta potential of the particulate layer+zeta potential of the polishing composition, [Relationship 1]
 wherein the polishing layer comprises a polyurethane foam having a porous structure comprising a plurality of pores wherein the number average diameter of the plurality of pores ranges from 10 μm to 40 μm and the polyurethane foam is a cured product of a composition comprising a urethane-based prepolymer, a curing agent, a silicone-based surfactant, and a foaming agent, and a content of an inorganic substance in the polishing layer ranges from 5 ppm to 500 ppm,
wherein a content of the curing agent ranges from 18 parts by weight to 27 parts by weight based on 100 parts by weight of the urethane-based prepolymer,
wherein a content of the silicone-based surfactant ranges from 0.2 part by weight to 2 parts by weight based on 100 parts by weight of the urethane-based prepolymer,
wherein the inorganic substance comprises at least one element selected from the group consisting of a silicon (Si) element, a phosphorus (P) element, and a calcium (Ca) element, and
wherein when polishing is carried out using the third composition of the polishing composition including the ceria particles and having the hydrogen ion concentration (pH) of 7.5 to 9.5, the polishing surface of the polishing layer has a third surface zeta potential (PZ3), which is a value of surface zeta potential of the polishing surface derived by the above Relationship 1 for the third composition, and
first surface zeta potential (PZ1) and the third surface zeta potential (PZ3) satisfy the following Relationship 3:
 |