	US 12,358,210 B2
	Resin composition for stereolithography
Kenji Suzuki, Niigata (JP); Shumei Ishihara, Tokyo (JP); and Misaki Ito, Niigata (JP)
Assigned to KURARAY NORITAKE DENTAL INC., Kurashiki (JP)
Appl. No. 17/908,937
Filed by KURARAY NORITAKE DENTAL INC., Kurashiki (JP)
PCT Filed Mar. 5, 2021, PCT No. PCT/JP2021/008829 § 371(c)(1), (2) Date Sep. 2, 2022, PCT Pub. No. WO2021/177462, PCT Pub. Date Sep. 10, 2021.
Claims priority of application No. 2020-038883 (JP), filed on Mar. 6, 2020.
Prior Publication US 2023/0096105 A1, Mar. 30, 2023
Int. Cl. B29C 64/124 (2017.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B33Y 80/00 (2015.01); B29K 33/00 (2006.01); B29K 105/00 (2006.01); B29K 105/16 (2006.01); B29L 31/00 (2006.01)

CPC B29C 64/124 (2017.08) [B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12); B29K 2033/26 (2013.01); B29K 2105/0002 (2013.01); B29K 2105/16 (2013.01); B29L 2031/7536 (2013.01)]

23 Claims

1. A resin composition for stereolithography comprising a polymerizable monomer (a), a photopolymerization initiator (b), an inorganic particle (c) having an average particle diameter of 5 to 500 nm, and a hindered phenolic compound (d), wherein

the content of the photopolymerization initiator (b) is 0.1 to 10 parts by mass relative to 100 parts by mass of the polymerizable monomer (a),

the content of the inorganic particle (c) is 50 to 400 parts by mass relative to 100 parts by mass of the polymerizable monomer (a), and

the content of the hindered phenolic compound (d) is 5.0 to 500 parts by mass relative to 100 parts by mass of the photopolymerization initiator (b).