US 12,356,978 B2
System and apparatus for providing variable rate application of applicants to discrete field locations
John Kastl, Wahoo, NE (US); and Jacob L. LaRue, Owasso, OK (US)
Assigned to Valmont Industries, Inc.
Filed by Valmont Industries, Inc., Omaha, NE (US)
Filed on Sep. 19, 2023, as Appl. No. 18/469,737.
Application 18/469,737 is a continuation of application No. 16/899,704, filed on Jun. 12, 2020, granted, now 11,800,861.
Claims priority of provisional application 62/867,338, filed on Jun. 27, 2019.
Prior Publication US 2024/0000059 A1, Jan. 4, 2024
Int. Cl. A01M 7/00 (2006.01); A01B 79/00 (2006.01); A01C 21/00 (2006.01); A01C 23/04 (2006.01); G06V 20/10 (2022.01)
CPC A01M 7/0089 (2013.01) [A01B 79/005 (2013.01); A01C 21/005 (2013.01); A01C 23/047 (2013.01); G06V 20/188 (2022.01)] 23 Claims
OG exemplary drawing
 
1. A system for providing variable rate application of applicants to field locations, the system comprising:
an image sensor for providing crop image data;
a chemical application system comprising a main chemical conduit, a plurality of chemical sprayer pipes, a plurality of chemical sprayer valves and a plurality of chemical sprayer nozzles;
a water delivery system comprising a primary conduit, a plurality of water pipes, a plurality of water sprayer valves and a plurality of water sprayer nozzles;
a controller for the chemical application system and the water delivery system configured to: receive the crop image data; execute a first variable rate irrigation (VRI) prescription plan by directing a first applicant through the water delivery system; create a second VRI prescription plan for applying a second applicant to selected areas of the given field via the chemical application system based on analysis of the received crop image data; initiate the execution of the second VRI prescription plan; and
a system cleaning valve; wherein the system cleaning valve is movable between a first closed position and a second open position; wherein the system cleaning valve restricts the flow of water into the chemical application system when in the first closed position.