US D1,034,956 S
Face mask
Jana Bacinska, Brno (CZ); Daniel Yee, Santa Margarita, CA (US); Mark Peurifoy, Phoenix, AZ (US); Marie K. Hammer, Smithfield, RI (US); Sayanti Basu, Fort Mill, SC (US); José Antonio Fosado Rodríguez, Santa Bárbara (MX); and Alex Rochat, Ames, IA (US)
Assigned to HONEYWELL INTERNATIONAL INC., Charlotte, NC (US)
Filed by Honeywell International Inc., Charlotte, NC (US)
Filed on Mar. 31, 2021, as Appl. No. 29/776,719.
Term of patent 15 Years
LOC (14) Cl. 29 - 02
U.S. Cl. D24—110.1
OG exemplary drawing
 
We claim the ornamental design for a face mask, as shown and described.