US 12,035,600 B2
Display device including inorganic deposition layer on light emitting element
Woo Young Kim, Yongin-si (KR); Hyeo Ji Kang, Seoul (KR); Oh Jeong Kwon, Hwaseong-si (KR); Kyeong Jong Kim, Incheon (KR); Hong Yeon Lee, Suwon-si (KR); Sung Gyu Jang, Anyang-si (KR); and Seung Yeon Jeong, Hwaseong-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Gyeonggi-Do (KR)
Filed by Samsung Display Co., LTD., Yongin-si (KR)
Filed on Jul. 27, 2022, as Appl. No. 17/875,299.
Claims priority of application No. 10-2021-0177711 (KR), filed on Dec. 13, 2021.
Prior Publication US 2023/0189616 A1, Jun. 15, 2023
Int. Cl. H10K 59/40 (2023.01); G06F 3/044 (2006.01); H10K 50/844 (2023.01); H10K 50/86 (2023.01); H10K 59/122 (2023.01)
CPC H10K 59/40 (2023.02) [G06F 3/0446 (2019.05); H10K 50/844 (2023.02); H10K 50/865 (2023.02); H10K 59/122 (2023.02)] 13 Claims
OG exemplary drawing
 
1. A display device comprising:
a substrate;
a first electrode on the substrate;
a bank layer partially exposing a top surface of the first electrode;
a light emitting layer disposed on the partially exposed top surface of the first electrode;
a second electrode on the light emitting layer and the bank layer;
an inorganic deposition layer on the second electrode;
a thin film encapsulation layer on the inorganic deposition layer; and
a capping layer disposed between the inorganic deposition layer and the second electrode,
wherein the inorganic deposition layer comprises:
a first inorganic deposition layer;
a second inorganic deposition layer directly disposed between the first inorganic deposition layer and the thin film encapsulation layer; and
a third inorganic deposition layer directly disposed between the first inorganic deposition layer and the capping layer,
wherein the first inorganic deposition layer contains ytterbium (Yb), and each of the second inorganic deposition layer and the third inorganic deposition layer contains bismuth (Bi),
wherein a thickness of the first inorganic deposition layer is greater than a thickness of each of the second inorganic deposition layer and the third inorganic deposition layer.