CPC H01L 25/0753 (2013.01) [H01L 21/68 (2013.01); H01L 21/7806 (2013.01); H01L 33/005 (2013.01)] | 14 Claims |
1. An apparatus comprising:
a base comprising a receiving portion that receives a solvent and a substrate on which semiconductor elements are disposed; and
at least one ultrasonic generator that generates and applies ultrasonic waves to the substrate placed in the base, wherein
the base comprises sidewalls surrounding the receiving portion,
the at least one ultrasonic generator further comprises:
second ultrasonic generators disposed on sidewalls of the base in a first direction; and
third ultrasonic generators disposed on sidewalls of the base in a second direction in a plan view, and
the second ultrasonic generators and the third ultrasonic generators generate ultrasonic waves in a direction horizontal to the lower surface of the base.
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