US 12,033,834 B2
Flow rate controller, gas supply system, and flow rate control method
Atsushi Sawachi, Miyagi (JP)
Assigned to TOKYO ELECTRON LIMITED, Tokyo (JP)
Appl. No. 16/979,812
Filed by TOKYO ELECTRON LIMITED, Tokyo (JP)
PCT Filed Jun. 26, 2019, PCT No. PCT/JP2019/025367
§ 371(c)(1), (2) Date Sep. 10, 2020,
PCT Pub. No. WO2020/008975, PCT Pub. Date Jan. 9, 2020.
Claims priority of application No. 2018-126105 (JP), filed on Jul. 2, 2018; and application No. 2019-104938 (JP), filed on Jun. 5, 2019.
Prior Publication US 2021/0111004 A1, Apr. 15, 2021
Int. Cl. H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/67 (2006.01)
CPC H01J 37/32449 (2013.01) [H01J 37/32091 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01)] 4 Claims
OG exemplary drawing
 
1. A flow rate controller comprising:
a valve configured to control a flow rate of a gas supplied to a processing device; and a controller configured to:
compensate for flow overshoot or undershoot during the transition period so as to bring the actual cumulative flow equal to target flow during the transition period;
open the valve to start the control of the flow rate of the gas when the processing device has issued a flow command that instructs a start of supplying gas;
determine by integrating the actual flow, cumulative flow from the start of flow command to a predetermined time point in the transition period and determine a difference between the actual cumulative flow and the target cumulative flow for the same period, and
compensate for the difference by increasing or decreasing the flow rate during the remaining part of the transition period by determining a new slope of the flow waveform to adjust the flow valve.