US 12,032,301 B2
Substrate support, lithographic apparatus and loading method
Johannes Onvlee, 's-Hertogenbosch (NL); Antonius Franciscus Johannes De Groot, Someren (NL); Wim Symens, Leuven (BE); and David Ferdinand Vles, Eindhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Dec. 29, 2022, as Appl. No. 18/090,873.
Application 18/090,873 is a continuation of application No. 16/092,021, granted, now 11,556,063, previously published as PCT/EP2017/056644, filed on Mar. 21, 2017.
Claims priority of application No. 16166176 (EP), filed on Apr. 20, 2016.
Prior Publication US 2023/0134837 A1, May 4, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70708 (2013.01) [G03F 7/70691 (2013.01); G03F 7/707 (2013.01); G03F 7/70733 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate support comprising:
a body comprising a support surface to support a substrate;
a clamp system configured to provide a clamping force to clamp the substrate on the support surface, the clamp system comprising a conduit to convey a flow of fluid from the support surface to an underpressure source; and
a dither device configured to dither the clamping force of the substrate, wherein the dither device is configured to alter a cross-section of the conduit.