US 12,032,299 B2
Metrology method and associated metrology and lithographic apparatuses
Patricius Aloysius Jacobus Tinnemans, Hapert (NL); Igor Matheus Petronella Aarts, Port Chester, NY (US); Kaustuve Bhattacharyya, Veldhoven (NL); Ralph Brinkhof, Vught (NL); Leendert Jan Karssemeijer, s Hertogenbosch (NL); Stefan Carolus Jacobus Antonius Keij, Breda (NL); Haico Victor Kok, Veldhoven (NL); Simon Gijsbert Josephus Mathijssen, Rosmalen (NL); Henricus Johannes Lambertus Megens, Waalre (NL); and Samee Ur Rehman, Milpitas, CA (US)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/784,566
Filed by ASML NETHERLANDS B.V., Veldhoven (NL); and ASML HOLDING N.V., Veldhoven (NL)
PCT Filed Dec. 3, 2020, PCT No. PCT/EP2020/084387
§ 371(c)(1), (2) Date Jun. 10, 2022,
PCT Pub. No. WO2021/122016, PCT Pub. Date Jun. 24, 2021.
Claims priority of application No. 19216683 (EP), filed on Dec. 16, 2019.
Prior Publication US 2023/0017491 A1, Jan. 19, 2023
Int. Cl. G03F 7/00 (2006.01); G03F 9/00 (2006.01)
CPC G03F 7/70633 (2013.01) [G03F 7/706837 (2023.05); G03F 9/7034 (2013.01); G03F 9/7092 (2013.01)] 25 Claims
OG exemplary drawing
 
1. A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviations, the method comprising:
obtaining at least one intensity asymmetry value relating to the one or more asymmetric deviations, wherein the at least one intensity asymmetry value comprises a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by the structure;
determining at least one phase offset value corresponding to the one or more asymmetric deviations based on the at least one intensity asymmetry value; and
determining one or more measurement corrections for the one or more asymmetric deviation from the at least one phase offset value.