US 12,032,297 B2
Method for monitoring lithographic apparatus
Emil Peter Schmitt-Weaver, Eindhoven (NL); Kaustuve Bhattacharyya, Veldhoven (NL); and Martin Kers, Utrecht (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/291,513
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Oct. 15, 2019, PCT No. PCT/EP2019/077844
§ 371(c)(1), (2) Date May 5, 2021,
PCT Pub. No. WO2020/099050, PCT Pub. Date May 22, 2020.
Claims priority of application No. 18206696 (EP), filed on Nov. 16, 2018; and application No. 19181883 (EP), filed on Jun. 24, 2019.
Prior Publication US 2022/0026809 A1, Jan. 27, 2022
Int. Cl. G03F 7/20 (2006.01); G03F 7/00 (2006.01); G05B 13/04 (2006.01)
CPC G03F 7/705 (2013.01) [G05B 13/042 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method comprising:
decomposing first height variation data of a first substrate, into at least a substrate specific fingerprint;
determining a model based at least partially on the first height variation data, first performance data of the first substrate and the substrate specific fingerprint;
obtaining second height variation data of a second substrate;
inputting the second height variation data to the model;
determining, by running the model using a hardware computer system, second performance data of the second substrate; and
determining a parameter of a lithographic apparatus based on the second performance data.