US 12,032,293 B2
Composition for forming organic film, patterning process, and polymer
Daisuke Kori, Joetsu (JP); Takayoshi Nakahara, Joetsu (JP); Yasuyuki Yamamoto, Joetsu (JP); Hironori Satoh, Joetsu (JP); and Tsutomu Ogihara, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed on Apr. 7, 2020, as Appl. No. 16/841,773.
Claims priority of application No. 2019-88216 (JP), filed on May 8, 2019.
Prior Publication US 2020/0356007 A1, Nov. 12, 2020
Int. Cl. G03F 7/11 (2006.01); C08G 61/02 (2006.01); C08L 83/04 (2006.01); G03F 7/00 (2006.01); G03F 7/34 (2006.01); H01L 21/311 (2006.01)
CPC G03F 7/11 (2013.01) [C08G 61/02 (2013.01); C08L 83/04 (2013.01); G03F 7/34 (2013.01); G03F 7/70283 (2013.01); C08G 2261/135 (2013.01); C08G 2261/3142 (2013.01); C08G 2261/90 (2013.01); H01L 21/31144 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A composition for forming an organic film, comprising:
a polymer having a structure shown by the following general formula (1A); and
an organic solvent,

OG Complex Work Unit Chemistry
wherein Ar1 and Ar2 each represent a benzene ring or a naphthalene ring which optionally have a substituent,
wherein the polymer is a copolymer derived from only reactive monomers, and
wherein the polymer further has a partial structure shown by the following general formula (1C):

OG Complex Work Unit Chemistry
wherein W2 represents a monovalent organic group having 1 to 50 carbon atoms; and
Ar1 and Ar2 are as defined above.