US 12,032,290 B2
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
Daisuke Asakawa, Shizuoka (JP); Takashi Kawashima, Shizuoka (JP); Akiyoshi Goto, Shizuoka (JP); Michihiro Shirakawa, Shizuoka (JP); and Kei Yamamoto, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Jun. 11, 2021, as Appl. No. 17/344,967.
Application 17/344,967 is a continuation of application No. PCT/JP2019/047718, filed on Dec. 5, 2019.
Claims priority of application No. 2018-239960 (JP), filed on Dec. 21, 2018.
Prior Publication US 2021/0318616 A1, Oct. 14, 2021
Int. Cl. G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01)
CPC G03F 7/0397 (2013.01) [G03F 7/0045 (2013.01); G03F 7/2004 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/327 (2013.01); G03F 7/40 (2013.01)] 13 Claims
 
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a resin P having a repeating unit represented by General Formula (P1); and
a photoacid generator Aw,
wherein the photoacid generator Aw is a compound that generates an acid having a pKa of −1.40 or more upon irradiation with actinic rays or radiation,
the acid having a pKa of −1.40 or more is a sulfonic acid represented by any of General Formulae (Aw-1), (Aw-2), and (I) to (V),

OG Complex Work Unit Chemistry
in General Formula (P1),
Mp represents a single bond or a divalent linking group,
Lp represents a divalent linking group,
Xp represents O, S, or NRN1, RN1 represents a hydrogen atom or a monovalent organic group, and
Rp represents a monovalent organic group,

OG Complex Work Unit Chemistry
in General Formula (Aw-1), R11W represents a hydrogen atom or a monovalent organic group, R12W represents a monovalent organic group, and Rf1W represents a fluorine atom or a monovalent organic group including a fluorine atom,
in General Formula (Aw-2), R21W, R22W, and R23W each independently represent a hydrogen atom, a fluorine atom, or a monovalent organic group, R24W represents a monovalent organic group, and Rf2W represents a fluorine atom or a monovalent organic group including a fluorine atom,
in General Formula (I), R11 and R12 each independently represent a monovalent organic group, R13 represents a hydrogen atom or a monovalent organic group, L1 represents a group represented by —CO—O—, —CO—, —O—, —S—, —O—CO—, —S—CO—, or —CO—S—, and two selected from R11, R12 and R13 may be bonded to each other to form a ring,
in General Formula (II), R21 and R22 each independently represent a monovalent organic group, R23 represents a hydrogen atom or a monovalent organic group, L2 represents a group represented by —CO—, —O—, —S—, —O—CO—, —S—CO—, or —CO—S—, and two selected from R21, R22, and R23 may be bonded to each other to form a ring,
in General Formula (III), R31 and R33 each independently represent a hydrogen atom or a monovalent organic group, and R31 and R33 may be bonded to each other to form a ring,
in General Formula (IV), R41 and R43 each independently represent a hydrogen atom or a monovalent organic group, and R41 and R43 may be bonded to each other to form a ring, and
in General Formula (V), R51, R52, and R53 each independently represent a hydrogen atom or a monovalent organic group, and two selected from R51, R52, and R53 may be bonded to each other to form a ring.