US 12,032,288 B2
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
Masafumi Kojima, Shizuoka (JP); Minoru Uemura, Shizuoka (JP); Akihiro Kaneko, Shizuoka (JP); Akiyoshi Goto, Shizuoka (JP); and Kei Yamamoto, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on May 4, 2021, as Appl. No. 17/307,091.
Application 17/307,091 is a continuation of application No. PCT/JP2020/000835, filed on Jan. 14, 2020.
Claims priority of application No. 2019-012485 (JP), filed on Jan. 28, 2019; and application No. 2019-237307 (JP), filed on Dec. 26, 2019.
Prior Publication US 2021/0356862 A1, Nov. 18, 2021
Int. Cl. G03F 7/004 (2006.01); C07C 25/18 (2006.01); C07C 309/06 (2006.01); C07C 309/12 (2006.01); C07C 309/17 (2006.01); C07C 311/48 (2006.01); C07C 381/12 (2006.01); C07D 327/06 (2006.01); C07D 333/46 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 25/18 (2013.01); C07C 309/06 (2013.01); C07C 309/12 (2013.01); C07C 309/17 (2013.01); C07C 311/48 (2013.01); C07C 381/12 (2013.01); C07D 327/06 (2013.01); C07D 333/46 (2013.01); C07C 2602/42 (2017.05); C07C 2603/74 (2017.05)] 7 Claims
 
1. An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
a compound represented by General Formula (I); and
an acid-decomposable resin,
M1+A−-L-B−M2+  (I)
in General Formula (I), M1+ and M2+ each independently represent an organic cation,
L represents a divalent organic group,
A− represents an acid anion group,
provided that in a compound represented by HA-L-BH in which M1+ and M2+ of the compound represented by General Formula (I) are each substituted with a hydrogen atom, a pKa of a group represented by HA is lower than a pKa of a group represented by BH, and
B− represents a group represented by any of General Formulae (B-1), (B-2) and (B-4),

OG Complex Work Unit Chemistry
in General Formulae (B-1), (B-2) and (B-4), * represents a bonding position, and
RB represents a cycloalkyl group which may have a substituent, an aromatic ring group which may have a substituent, or an alkyl group which may have a substituent, the alkyl group not being a perfluoroalkyl group.