US 12,032,286 B2
Method for producing multi-layered type microchannel device using photosensitive resin laminate
Hidenori Nagai, Ikeda (JP); Shunsuke Furutani, Ikeda (JP); Kanako Mizumura, Tokyo (JP); and Yuzo Kotani, Tokyo (JP)
Assigned to ASAHI KASEI KABUSHIKI KAISHA, Tokyo (JP); and NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, Tokyo (JP)
Filed by ASAHI KASEI KABUSHIKI KAISHA, Tokyo (JP); and NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, Tokyo (JP)
Filed on Jun. 16, 2020, as Appl. No. 16/902,962.
Claims priority of application No. 2019-111686 (JP), filed on Jun. 17, 2019.
Prior Publication US 2020/0393754 A1, Dec. 17, 2020
Int. Cl. G03F 7/00 (2006.01); B01L 3/00 (2006.01); B81C 1/00 (2006.01); G03F 7/09 (2006.01); G03F 7/32 (2006.01)
CPC G03F 7/0035 (2013.01) [B01L 3/502707 (2013.01); B81C 1/00071 (2013.01); G03F 7/094 (2013.01); G03F 7/32 (2013.01); B81C 2201/0159 (2013.01)] 23 Claims
 
1. A method for producing a microchannel device comprising:
(i) a step of sequentially carrying out step (i-a) of forming a first photosensitive resin layer on a substrate; step (i-b) of light-exposing the first photosensitive resin layer to obtain a light-exposed photosensitive layer of the first photosensitive resin layer, step (i-c) of developing the light-exposed photosensitive layer of the first photosensitive resin layer by using a first developing solution and forming a channel pattern layer, and step (i-d) of cleaning by acid or divalent ion-containing water, to form a first channel pattern layer; and
(ii) a step of sequentially carrying out step (ii-a) of laminating a second photosensitive resin laminate on the first channel pattern layer formed in the step (i); step (ii-b) of light-exposing a photosensitive layer of the second photosensitive resin laminate to obtain a light-exposed photosensitive layer of the second photosensitive resin laminate; step (ii-c) of developing the light-exposed photosensitive layer of the second photosensitive resin laminate by using a second developing solution and forming a channel pattern layer, and step (ii-d) of cleaning by acid or divalent ion-containing water, to form a second channel pattern layer,
wherein the first and second photosensitive resin layers comprise a carboxyl group- containing alkali soluble polymer (a), and the carboxyl group-containing alkali soluble polymer (a) has an acid equivalent of 100 to 600 and a weight-average molecular weight of 5,000 to 500,000,
wherein the first developing solution and the second developing solution are an alkaline aqueous solution, and
wherein the acid or divalent ion-containing water has a concentration of 0.1 to 20% by weight.