CPC G03F 7/0035 (2013.01) [B01L 3/502707 (2013.01); B81C 1/00071 (2013.01); G03F 7/094 (2013.01); G03F 7/32 (2013.01); B81C 2201/0159 (2013.01)] | 23 Claims |
1. A method for producing a microchannel device comprising:
(i) a step of sequentially carrying out step (i-a) of forming a first photosensitive resin layer on a substrate; step (i-b) of light-exposing the first photosensitive resin layer to obtain a light-exposed photosensitive layer of the first photosensitive resin layer, step (i-c) of developing the light-exposed photosensitive layer of the first photosensitive resin layer by using a first developing solution and forming a channel pattern layer, and step (i-d) of cleaning by acid or divalent ion-containing water, to form a first channel pattern layer; and
(ii) a step of sequentially carrying out step (ii-a) of laminating a second photosensitive resin laminate on the first channel pattern layer formed in the step (i); step (ii-b) of light-exposing a photosensitive layer of the second photosensitive resin laminate to obtain a light-exposed photosensitive layer of the second photosensitive resin laminate; step (ii-c) of developing the light-exposed photosensitive layer of the second photosensitive resin laminate by using a second developing solution and forming a channel pattern layer, and step (ii-d) of cleaning by acid or divalent ion-containing water, to form a second channel pattern layer,
wherein the first and second photosensitive resin layers comprise a carboxyl group- containing alkali soluble polymer (a), and the carboxyl group-containing alkali soluble polymer (a) has an acid equivalent of 100 to 600 and a weight-average molecular weight of 5,000 to 500,000,
wherein the first developing solution and the second developing solution are an alkaline aqueous solution, and
wherein the acid or divalent ion-containing water has a concentration of 0.1 to 20% by weight.
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