US 12,031,927 B2
Method and device for analyzing diffraction pattern of mixture, and information storage medium
Hideo Toraya, Akishima (JP)
Assigned to RIGAKU CORPORATION, Tokyo (JP)
Filed by Rigaku Corporation, Akishima (JP)
Filed on Dec. 9, 2021, as Appl. No. 17/546,656.
Claims priority of application No. 2020-206310 (JP), filed on Dec. 11, 2020.
Prior Publication US 2022/0187225 A1, Jun. 16, 2022
Int. Cl. G01N 23/2055 (2018.01)
CPC G01N 23/2055 (2013.01) [G01N 2223/605 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A method of analyzing a diffraction pattern of a mixture, the method comprising:
obtaining an observed pattern by performing an X-ray diffraction measurement with an X-ray diffractometer;
acquiring the observed pattern of the X-ray diffraction from the X-ray diffractometer;
acquiring a known target pattern from the X-ray diffractometer;
acquiring a fitting pattern by taking summation of a first term obtained by multiplying the known target pattern indicating a target component by a first intensity ratio, and a second term obtained by multiplying an unknown pattern indicating a residual group consisting of one or more residual components by a second intensity ratio, and an intensity of a temporary pattern, wherein the fitting pattern has the first intensity ratio, the second intensity ratio, and the unknown pattern as fitting parameters;
fitting the fitting pattern to the observed pattern by changing the first intensity ratio and the second intensity ratio in a state where the unknown pattern is set to an initial pattern; and
fitting, after the fitting the fitting pattern by changing the first intensity ratio and the second intensity ratio, the fitting pattern to the observed pattern by changing the unknown pattern while restricting the changes of the first intensity ratio and the second intensity ratio.