US 12,031,076 B2
Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same
Jonghee Park, Hwaseong-si (KR); Hyoung Sik Kim, Seoul (KR); O Byoung Kwon, Jeonju-si (KR); Gi-Yong Nam, Hwaseong-si (KR); Kyungchan Min, Ansan-si (KR); Suck Jun Lee, Jeonju-si (KR); Youngmin Kim, Asan-si (KR); Jinhyung Kim, Cheonan-si (KR); Donghun Lee, Asan-si (KR); Kyu-Hun Lim, Cheonan-si (KR); and Dongmin Jang, Cheonan-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-Si (KR)
Filed on Mar. 17, 2023, as Appl. No. 18/122,706.
Application 18/122,706 is a division of application No. 17/388,712, filed on Jul. 29, 2021, granted, now 11,639,470.
Claims priority of application No. 10-2020-0185187 (KR), filed on Dec. 28, 2020.
Prior Publication US 2023/0220280 A1, Jul. 13, 2023
Int. Cl. C09K 13/06 (2006.01); C23F 1/02 (2006.01); C23F 1/44 (2006.01); H10K 59/12 (2023.01); H10K 71/00 (2023.01); H10K 71/20 (2023.01)
CPC C09K 13/06 (2013.01) [C23F 1/02 (2013.01); C23F 1/44 (2013.01); H10K 59/1201 (2023.02); H10K 71/233 (2023.02); H10K 71/621 (2023.02)] 9 Claims
OG exemplary drawing
 
1. A method for forming a pattern, the method comprising:
forming a multilayer comprising a silver-containing thin film and a metal oxide thin film;
etching the metal oxide thin film using a first etching composition; and
etching the silver-containing thin film using a second etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound and water,
wherein the nitrate comprises calcium nitrate.