US 12,030,974 B2
Composition for forming block copolymer layer for formation of microphase-separated pattern
Ryuta Mizuochi, Toyama (JP); Yasunobu Someya, Toyama (JP); Hiroyuki Wakayama, Toyama (JP); Masami Kozawa, Funabashi (JP); and Shinsuke Tadokoro, Funabashi (JP)
Assigned to NISSAN CHEMICAL CORPORATION, Tokyo (JP)
Appl. No. 17/258,227
Filed by NISSAN CHEMICAL CORPORATION, Tokyo (JP)
PCT Filed Jul. 16, 2019, PCT No. PCT/JP2019/027889
§ 371(c)(1), (2) Date Jan. 6, 2021,
PCT Pub. No. WO2020/017494, PCT Pub. Date Jan. 23, 2020.
Claims priority of application No. 2018-134225 (JP), filed on Jul. 17, 2018.
Prior Publication US 2021/0284782 A1, Sep. 16, 2021
Int. Cl. C08F 299/02 (2006.01); B29C 71/02 (2006.01); C08F 212/08 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); C08F 222/40 (2006.01); C08F 230/08 (2006.01); C08J 5/18 (2006.01); H01L 21/3065 (2006.01)
CPC C08F 299/02 (2013.01) [C08F 212/08 (2013.01); C08F 212/22 (2020.02); C08F 220/18 (2013.01); C08F 222/40 (2013.01); C08F 230/08 (2013.01); C08J 5/18 (2013.01); C08J 7/08 (2013.01); H01L 21/3065 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A formulation comprising a block copolymer composition and an underlayer film-forming composition, wherein the formulation is for forming a phase-separated structure in a block copolymer layer formed from the block copolymer composition on an underlayer film formed from the underlayer film-forming composition on a substrate,
wherein the underlayer film-forming composition comprises a copolymer comprising the following unit structures:
unit structure (A) derived from a styrene compound containing a tert-butyl group,
unit structure (B) derived from an aromatic-containing vinyl compound containing no hydroxy group with the proviso that it is different from unit structure (A),
unit structure (C) derived from a compound containing a (meth)acryloyl group and no hydroxy groups, and
unit structure (D) derived from a crosslinking group-containing compound,
wherein a copolymerization ratio relative to an entirety of the copolymer ranges from 25 to 90% by mole of unit structure (A), from 0 to 65% by mole of unit structure (B), from 0 to 65% by mole of unit structure (C), and from 10 to 20% by mole of unit structure (D),
wherein the block copolymer composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a silicon-free polymer and a silicon-containing polymer bonded together,
wherein the silicon-containing polymer comprises a unit structure represented by the following formula (2):

OG Complex Work Unit Chemistry
wherein, in formula (2), R6, R7 and R8 are each independently a C1-C10 alkyl group or a C6-C40 aryl group, and
wherein the silicon-free polymer comprises a unit structure represented by formula (1-1) or formula (1-2) below,

OG Complex Work Unit Chemistry
wherein in formula (1-1) and formula (1-2), R1 and R2 are each independently a hydrogen atom, a halogen atom or a C1-C10 alkyl group; and R3 to R5 are each independently a hydrogen atom, a hydroxy group, a halogen atom, a C1-C10 alkyl group, a C1-C10 alkoxy group, a cyano group, an amino group, an amide group or a carbonyl group.