CPC B05B 12/004 (2013.01) [B05B 13/0228 (2013.01); B05B 13/0421 (2013.01); B05B 15/62 (2018.02)] | 16 Claims |
1. A substrate treating apparatus comprising:
a cup providing a treatment space to an interior of the substrate treating apparatus;
a spin chuck configured to support and rotate a substrate in the treatment space; and
a liquid supply unit configured to supply a treatment liquid onto a to-be-treated surface of the substrate supported by the spin chuck,
wherein the liquid supply unit includes:
a support shaft spaced apart from the spin chuck by a specific distance, and extending to have a specific length in a direction that is perpendicular to a ground surface;
a nozzle support, including a first end of which is coupled to an upper end of the support shaft, the nozzle support extending to have a specific length in a direction that is parallel to the ground surface;
a nozzle installed at a second end of the nozzle support, the second end located at an opposite end of the nozzle support and configured to supply the treatment liquid to the substrate; and
a motion sensor configured to detect any one or more of a deflection, a distortion, and a vibration of the liquid supply unit,
wherein the motion sensor is installed at the second end of the nozzle support at a location that is adjacent to the nozzle,
wherein the motion sensor collects vibration data in real time during an operation of the liquid supply unit, and
wherein the motion sensor further includes:
a comparator configured to compare vibration data according to a type of a cause of an abnormality occurring during the operation of the liquid supply unit with the collected vibration data; and
an alarm member configured to notify an outside of a cause of an abnormality of the liquid supply unit derived through comparison by the comparator.
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