US 11,699,601 B2
Substrate processing method
Tomohiro Takahashi, Kyoto (JP); Kei Takechi, Kyoto (JP); Mitsutoshi Sasaki, Kyoto (JP); and Takashi Akiyama, Kyoto (JP)
Assigned to SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed by SCREEN Holdings Co., Ltd., Kyoto (JP)
Filed on Jun. 27, 2021, as Appl. No. 17/359,629.
Application 17/359,629 is a division of application No. 16/551,707, filed on Aug. 26, 2019, abandoned.
Claims priority of application No. 2018-177250 (JP), filed on Sep. 21, 2018.
Prior Publication US 2021/0327729 A1, Oct. 21, 2021
Int. Cl. H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/677 (2006.01); H01L 21/302 (2006.01)
CPC H01L 21/67086 (2013.01) [H01L 21/02052 (2013.01); H01L 21/02343 (2013.01); H01L 21/302 (2013.01); H01L 21/6708 (2013.01); H01L 21/6715 (2013.01); H01L 21/67017 (2013.01); H01L 21/67253 (2013.01); H01L 21/67259 (2013.01); H01L 21/67757 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A substrate processing method comprising:
a step of providing a processing tank inside which a first fluid supply unit for supplying a fluid to the processing tank, a second fluid supply unit for supplying a fluid to the processing tank, and a liquid supply unit for supplying a liquid to the processing tank are disposed;
a step of storing a processing liquid in the processing tank;
a step of immersing at least one substrate in the processing liquid stored in the processing tank; and
a step of performing fluid supply to the processing tank, wherein
in the step of providing a processing tank,
the liquid supply unit is configured below a location of the at least one substrate in the processing liquid in the step of immersing the at least one substrate,
the liquid supply unit includes:
a first liquid supply tube configured at one side with respect to a vertical central axis of the at least one substrate; and
a second liquid supply tube configured at another side with respect to the vertical central axis of the at least one substrate,
the first liquid supply tube is configured with first ejection ports directed to the at least one substrate with inclination with respect to the vertical central axis of the at least one substrate,
the second liquid supply tube is configured with second ejection ports directed to the at least one substrate with inclination with respect to the vertical central axis of the at least one substrate,
the first fluid supply unit includes a first fluid supply tube and a second fluid supply tube,
the second fluid supply unit includes a third fluid supply tube and a fourth fluid supply tube,
the first fluid supply tube is configured between the vertical central axis of the at least one substrate and the first liquid supply tube,
the second fluid supply tube is configured between the vertical central axis of the at least one substrate and the second liquid supply tube,
the first liquid supply tube is configured between the third fluid supply tube and the first fluid supply tube, and
the second liquid supply tube is configured between the fourth fluid supply tube and the second fluid supply tube,
the step of performing fluid supply includes:
supplying, in a first timing, a gas as the fluid to the processing tank by the first fluid supply tube and the second fluid supply tube of the first fluid supply unit while supplying the liquid to the processing tank by the first liquid supply tube and the second liquid supply tube with the at least one substrate immersed in the processing liquid in the processing tank; and
supplying, in a second timing, the fluid to the processing tank by the third fluid supply tube and the fourth fluid supply tube of the second fluid supply unit while supplying the liquid to the processing tank by the first liquid supply tube and the second liquid supply tube with the at least one substrate immersed in the processing liquid in the processing tank, the second timing being different from the first timing.