US 11,699,599 B2
Substrate transfer apparatus and substrate treating apparatus
Byung Kyu Kim, Seoul (KR); and Dukhyun Son, Cheonan-si (KR)
Assigned to Semes Co., Ltd., Chungcheongnam-do (KR)
Filed by SEMES CO., LTD., Cheonan-si (KR)
Filed on Oct. 15, 2020, as Appl. No. 17/71,258.
Claims priority of application No. 10-2019-0128918 (KR), filed on Oct. 17, 2019.
Prior Publication US 2021/0118702 A1, Apr. 22, 2021
Int. Cl. H01L 21/67 (2006.01); H01L 21/687 (2006.01); B65G 47/90 (2006.01); H01L 21/677 (2006.01)
CPC H01L 21/67017 (2013.01) [B65G 47/90 (2013.01); H01L 21/67742 (2013.01); H01L 21/68707 (2013.01); H01L 21/67196 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A substrate transfer apparatus comprising:
a transfer robot;
a linear rail unit including a movable plate on which the transfer robot is mounted and a running shaft on which the movable plate travels; and
a particle diffusion reduction member configured to prevent diffusion of particles by maintaining a differential pressure between the movable plate and the running shaft,
wherein the particle diffusion reduction member includes:
a gas supply unit configured to supply an inert gas into a space between the movable plate and the running shaft;
an exhaust port configured to suction air around the running shaft from below the running shaft; and
a shielding cover member configured to prevent particles generated in the space between the movable plate and the running shaft and the inert gas supplied from the gas supply unit from diffusing to outside the shielding cover member,
wherein the gas supply unit includes a gas supply hole facing the shielding cover member.