CPC H01L 21/3212 (2013.01) [B08B 7/0035 (2013.01); B24B 37/005 (2013.01)] | 14 Claims |
1. A substrate cleaning system, comprising:
a cleaner module to clean a substrate after polishing of the substrate;
a drier module to dry the substrate after the substrate is cleaned by the cleaner module, wherein the drier module comprises a tank to hold a rinse bath;
a substrate support movable along a first axis that is substantially parallel to a face of the substrate as held by the substrate support; and
an in-line metrology station including a line-scan camera positioned and configured to scan a portion of the substrate that is out of the rinse bath to obtain a part of an image of the substrate whilst the substrate is partially immersed in the rinse bath.
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