CPC H01J 37/3171 (2013.01) [H01J 37/222 (2013.01); H01J 37/304 (2013.01); H01J 2237/20207 (2013.01)] | 20 Claims |
1. An ion implanter comprising:
a beamline unit that transports an ion beam;
an implantation processing chamber in which implantation processing is performed to irradiate a wafer with the ion beam;
an illumination device that performs irradiation with illumination light in a direction intersecting with a transport direction of the ion beam in at least one of the beamline unit and the implantation processing chamber;
an imaging device that generates a captured image captured by imaging a space through which the illumination light passes; and
a control device that detects a particle which scatters the illumination light, based on the captured image.
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