	US 11,698,588 B2
	Substrate hydrophilizing agent
Yuichi Sakanishi, Tokyo (JP)
Assigned to DAICEL CORPORATION, Osaka (JP)
Appl. No. 16/971,970
Filed by DAICEL CORPORATION, Osaka (JP)
PCT Filed Jan. 30, 2019, PCT No. PCT/JP2019/003222 § 371(c)(1), (2) Date Aug. 21, 2020, PCT Pub. No. WO2019/163455, PCT Pub. Date Aug. 29, 2019.
Claims priority of application No. 2018-029605 (JP), filed on Feb. 22, 2018.
Prior Publication US 2020/0393765 A1, Dec. 17, 2020
Int. Cl. G03F 7/11 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01)

CPC G03F 7/11 (2013.01) [G03F 7/0002 (2013.01); H01L 21/0274 (2013.01)]

13 Claims

1. A substrate hydrophilizing agent for hydrophilizing a surface of a substrate on which a pattern is formed through photolithography, the substrate hydrophilizing agent comprising at least Components (A) and (B) below:

Component (A): a water-soluble oligomer having a weight average molecular weight from 100 to less than 10000, and

Component (B): water,

wherein a content of the Component (A) is from 1.5 wt. % to 5.0 wt. % of a total amount of the substrate hydrophilizing agent.