US 11,698,587 B2
Resist underlayer composition, and method of forming patterns using the composition
Shinhyo Bae, Suwon-si (KR); Soonhyung Kwon, Suwon-si (KR); Hyeon Park, Suwon-si (KR); Jaeyeol Baek, Suwon-si (KR); Beomjun Joo, Suwon-si (KR); and Yoojeong Choi, Suwon-si (KR)
Assigned to SAMSUNG SDI CO., LTD., Yongin-si (KR)
Filed by SAMSUNG SDI CO., LTD., Yongin-si (KR)
Filed on Jun. 10, 2019, as Appl. No. 16/436,140.
Claims priority of application No. 10-2018-0066832 (KR), filed on Jun. 11, 2018.
Prior Publication US 2019/0377262 A1, Dec. 12, 2019
Int. Cl. G03F 7/09 (2006.01); G03F 7/11 (2006.01); C08G 18/02 (2006.01); C08L 71/00 (2006.01); G03F 7/36 (2006.01); G03F 7/004 (2006.01); C08L 75/04 (2006.01); C08L 61/06 (2006.01); C08L 63/00 (2006.01); C08L 61/28 (2006.01)
CPC G03F 7/091 (2013.01) [C08G 18/022 (2013.01); C08L 61/06 (2013.01); C08L 61/28 (2013.01); C08L 63/00 (2013.01); C08L 71/00 (2013.01); C08L 75/04 (2013.01); G03F 7/0041 (2013.01); G03F 7/0045 (2013.01); G03F 7/094 (2013.01); G03F 7/36 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A resist underlayer composition, comprising:
a polymer including a structural unit that is a reaction product of an isocyanurate compound and a compound having at least one reactive functional group, and
a solvent,
wherein:
the isocyanurate compound is represented by Chemical Formula 1:

OG Complex Work Unit Chemistry
in Chemical Formula 1, R1 to R3 are each independently a substituted or unsubstituted C1 to C30 alkyl group, a substituted or unsubstituted C1 to C30 heteroalkyl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C2 to C30 heterocycloalkyl group, a substituted or unsubstituted C6 to C30 aryl group, or a substituted or unsubstituted C1 to C30 heteroaryl group, provided that at least one of R1 to R3 includes a thiol group substituent,
the compound having at least one reactive functional group is represented by one of the following Chemical Formula 2-1 to Chemical Formula 2-4:

OG Complex Work Unit Chemistry
in Chemical Formulae 2-1 to 2-4,
X1 to X4 are each independently CH2, O, or S,
R11 to R14 are each independently a substituted or unsubstituted C1 to C6 alkenyl group,
R15 and R16 are each independently hydrogen or a halogen atom, and
k, l, m, n, o, p, and q are each independently an integer of 0 to 10.