| CPC G03F 7/0002 (2013.01) [B29C 43/02 (2013.01)] | 11 Claims |
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1. An imprint apparatus operable to perform an imprint process, which is for forming a pattern on an imprint material on a substrate by using a mold, for each of shot regions of the substrate, the apparatus comprising:
a movable stage configured to hold the substrate;
a detector configured to detect a positional deviation between the mold and the substrate;
a curing device configured to cure an imprint material on the substrate; and
a controller configured to control alignment between the mold and the substrate and to control the curing device,
wherein the controller is configured to:
determine a target position based on the positional deviation detected by the detector;
start control of movement of the stage towards the determined target position without feeding back detection results of the detector;
obtain a change in the positional deviation between the mold and the substrate detected by the detector while the stage is being moved towards the determined target position without feeding back the detection results of the detector, and predict, while the stage is being moved towards the determined target position without feeding back the detection results of the detector, a timing at which the positional deviation between the mold and the substrate will fall within an allowable range based on the obtained change in the positional deviation between the mold and the substrate detected by the detector while controlling the movement of the stage towards the determined target position without feeding back the detection results of the detector; and
start curing of the imprint material by the curing device at the timing predicted while the stage is being moved towards the determined target position without feeding back the detection results of the detector,
wherein the movement of the stage is performed in a state where the mold and the imprint material on the substrate are in contact with each other.
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