CPC G01B 15/00 (2013.01) [G01B 15/02 (2013.01); G03F 7/70516 (2013.01); G03F 7/70633 (2013.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01); G01B 2210/56 (2013.01); H01L 21/0276 (2013.01); H10B 10/12 (2023.02)] | 22 Claims |
1. A metrology system comprising:
a Soft X-Ray (SXR) illumination source configured to illuminate a first instance of a measurement target disposed on a substrate with a beam of SXR radiation having energy in a range between 10 and 5,000 electronvolts, wherein the measurement target includes a first structure disposed in a first layer fabricated at a first height above the substrate and a second structure disposed in a second layer fabricated at a second height above the substrate;
an x-ray detector configured to detect a plurality of intensities each associated with one or more nonzero diffraction orders of an amount of x-ray radiation scattered from the measurement target in response to the incident beam of x-ray radiation; and
a computing system configured to
estimate a value of overlay error associated with the measurement target or a corresponding in-die active device structure based on the plurality of detected intensities within each of the one or more nonzero diffraction orders.
|