CPC C25D 17/10 (2013.01) [C25D 7/123 (2013.01); C25D 17/001 (2013.01); C25D 17/002 (2013.01); C25D 21/12 (2013.01); C25D 21/18 (2013.01)] | 20 Claims |
1. An electroplating system comprising:
an electroplating chamber; and
a replenish assembly fluidly coupled with the electroplating chamber, the replenish assembly comprising:
an anolyte compartment housing anode material, the anolyte compartment having a first compartment section in which the anode material is housed and a second compartment section separated from the first compartment section by a divider, wherein the divider fluidly separates the first compartment section from the second compartment section,
a second compartment fluidly coupled with the electroplating chamber and electrically coupled with the anolyte compartment, wherein the second compartment includes a catholyte, and
a third compartment electrically coupled with the second compartment, the third compartment comprising an inert cathode.
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