US 11,697,875 B2
Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber
Vishwas Kumar Pandey, Madhya Pradesh (IN); Eric Kihara Shono, San Mateo, CA (US); Kartik Shah, Saratoga, CA (US); Christopher S. Olsen, Fremont, CA (US); Agus Sofian Tjandra, Milpitas, CA (US); Tobin Kaufman-Osborn, Sunnyvale, CA (US); Taewan Kim, San Jose, CA (US); and Hansel Lo, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 24, 2019, as Appl. No. 16/662,134.
Claims priority of provisional application 62/782,551, filed on Dec. 20, 2018.
Prior Publication US 2020/0199748 A1, Jun. 25, 2020
Int. Cl. C23C 16/452 (2006.01); C23C 16/455 (2006.01); B01F 23/10 (2022.01); B01F 25/421 (2022.01); H01J 37/32 (2006.01); B01F 25/10 (2022.01); B01F 25/314 (2022.01); B01F 35/511 (2022.01); H01L 21/67 (2006.01)
CPC C23C 16/452 (2013.01) [B01F 23/10 (2022.01); B01F 23/19 (2022.01); B01F 25/102 (2022.01); B01F 25/3141 (2022.01); B01F 25/31423 (2022.01); B01F 25/421 (2022.01); B01F 35/511 (2022.01); C23C 16/45536 (2013.01); C23C 16/45548 (2013.01); C23C 16/45561 (2013.01); H01J 37/3244 (2013.01); H01J 37/32357 (2013.01); H01L 21/67017 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate processing system, comprising:
a process chamber;
a remote plasma source coupled to a processing volume of the process chamber by a plasma conduit;
a mixing plate disposed between the process chamber and the remote plasma source, the mixing plate including an opening therein through which the plasma conduit extends, the mixing plate including:
a first passage formed in the mixing plate and fluidly coupled to the plasma conduit, the first passage oriented tangentially with respect to the plasma conduit, the first passage including a primary axis extending along a fluid flow path of first passage, and a first outlet which opens into the plasma conduit; and
a second passage fluidly coupled to the plasma conduit, the second passage positioned inward of the first passage relative to a center of the plasma conduit, the second passage including a second outlet which opens into the plasma conduit, and a primary axis extending along a fluid flow path of the second passage, the primary axis of the second passage parallel to the primary axis of the first passage, the primary axis of the second passage and the primary axis of the first passage are disposed in a common plane.
 
8. A substrate processing system, comprising:
a process chamber;
a remote plasma source coupled to a processing volume of the process chamber by a plasma conduit;
a mixing plate disposed between the process chamber and the remote plasma source, the mixing plate including an opening therein through which the plasma conduit extends, the mixing plate including:
a first passage formed therein and fluidly coupled to the plasma conduit, the first passage oriented tangentially with respect to the plasma conduit, the first passage including a first outlet which opens into the plasma conduit; and
a second passage fluidly coupled to the plasma conduit, the second passage positioned parallel to and adjacent the first passage, the second passage including a second outlet which opens into the plasma conduit, the second passage and the first passage are disposed in a common plane.
 
17. A gas injection assembly, comprising:
a mixing plate, the mixing plate including an opening therein, the opening defining a plasma conduit, the opening including a central axis which is orthogonal to a major surface of the mixing plate, the mixing plate including:
a first passage formed in the mixing plate and fluidly coupled to the plasma conduit, the first passage oriented tangentially with respect to the plasma conduit, the first passage including a primary axis extending along a fluid flow path of first passage;
a second passage fluidly coupled to the plasma conduit, the second passage positioned inward of the first passage relative to a center of the plasma conduit, the second passage parallel to the first passage, the second passage including a primary axis extending along a fluid flow path of the second passage, the primary axis of the second passage parallel to the primary axis of the first passage, the primary axis of the second passage and the primary axis of the first passage are disposed in a common plane;
a third passage formed in the mixing plate, the third passage fluidly coupling the first passage to the second passage;
a fourth passage formed in the mixing plate and fluidly coupled to the plasma conduit, the fourth passage oriented tangentially with respect to the plasma conduit;
a fifth passage fluidly coupled to the plasma conduit, the fifth passage positioned inward of the first passage relative to the center of the plasma conduit, the second passage parallel to the fourth passage; and
a sixth passage formed in the mixing plate, the sixth passage fluidly coupling the fourth passage to the fifth passage.