US 11,696,664 B2
Cleaning apparatus
Kazuhiro Io, Tokyo (JP); Koji Sugita, Tokyo (JP); and Tomokazu Imae, Tokyo (JP)
Assigned to OMRON Corporation, Kyoto (JP)
Filed by OMRON Corporation, Kyoto (JP)
Filed on Jan. 19, 2022, as Appl. No. 17/578,581.
Claims priority of application No. 2021-036024 (JP), filed on Mar. 8, 2021.
Prior Publication US 2022/0279996 A1, Sep. 8, 2022
Int. Cl. A47L 5/34 (2006.01); A47L 9/00 (2006.01); A47L 9/04 (2006.01); A47L 9/06 (2006.01); A47L 9/14 (2006.01)
CPC A47L 5/34 (2013.01) [A47L 9/009 (2013.01); A47L 9/0494 (2013.01); A47L 9/066 (2013.01); A47L 9/1463 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A cleaning apparatus for cleaning a surface to be cleaned while moving on the surface to be cleaned, the cleaning apparatus comprising:
an apparatus body; and
a cleaning unit that is supported so that the cleaning unit is movable to retreat upward from a limit position in a vertical direction relative to the apparatus body and movable downward to return to the limit position, and is kept from moving downwardly from the limit position,
wherein the apparatus body comprises a shaft as a positioning member configured to position the cleaning unit at the limit position,
the cleaning unit comprises:
an intake nozzle that is arranged at a position separated by a predetermined gap from the surface to be cleaned;
a cam member configured to hold the cleaning unit at the limit position by a cam face being supported on an upper face of the positioning member; and
an adjustment dial as an operation input unit configured to apply, to the cam member, a force in a rotating direction of the cam member, and to change the limit position to a higher position by moving the cleaning unit upward by operating the cam member.