CPC H01L 23/5384 (2013.01) [G11C 5/06 (2013.01); H01L 23/5385 (2013.01); H01L 23/5386 (2013.01); H01L 25/0657 (2013.01); H03K 19/094 (2013.01)] | 29 Claims |
1. A multi-chip package comprising:
a first semiconductor integrated-circuit (IC) chip comprising a first silicon substrate, a plurality of first transistors at a top surface of the first silicon substrate and a first interconnection scheme over the first silicon substrate and coupling to the plurality of first transistors;
a second semiconductor integrated-circuit (IC) chip over and coupling to the first semiconductor integrated-circuit (IC) chip, wherein the second semiconductor integrated-circuit (IC) chip comprises a second silicon substrate, a plurality of second transistors at a bottom surface of the second silicon substrate and a second interconnection scheme under the second silicon substrate and coupling to the plurality of second transistors, wherein the second interconnection scheme comprises a first silicon-oxide-containing layer and a first bonding pad each at a bottom of the second semiconductor integrated-circuit (IC) chip, wherein the first bonding pad is in an opening in the first silicon-oxide-containing layer and couples to the first semiconductor integrated-circuit (IC) chip, wherein the first bonding pad comprises a first copper layer in the opening in the first silicon-oxide-containing layer and a first adhesion metal layer having a first portion at a sidewall of the first copper layer and a second portion at a top of the first copper layer, wherein the first copper layer has a bottom surface coplanar with a bottom surface of the first silicon-oxide-containing layer, wherein the second semiconductor integrated-circuit (IC) chip has a first edge over the first semiconductor integrated-circuit (IC) chip and a second edge opposite to the first edge and over the first semiconductor integrated-circuit (IC) chip;
a sealing layer over the first semiconductor integrated-circuit (IC) chip and at a same horizontal level as the second semiconductor integrated-circuit (IC) chip;
a first metal via over the first semiconductor integrated-circuit (IC) chip and vertically in the sealing layer;
a second metal via over the first semiconductor integrated-circuit (IC) chip, vertically in the sealing layer and coupling to the first bonding pad of the second semiconductor integrated-circuit (IC) chip;
a first metal pad vertically over and coupling to the first metal via;
a polymer layer over the second semiconductor integrated-circuit (IC) chip and sealing layer, wherein an opening in the polymer layer is vertically over the first metal pad and first metal via; and
a first metal bump on the first metal pad, vertically over the first metal via and at a top of the multi-chip package, wherein the first metal bump couples to the first metal via through the first metal pad.
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