US 12,354,839 B2
Radio-frequency antenna and plasma processing device
Akinori Ebe, Kyoto (JP); Hajime Tsuda, Shizuoka (JP); and Hideki Moriuchi, Shizuoka (JP)
Assigned to EMD CORPORATION, Yasu (JP); and TOMOEGAWA CORPORATION, Tokyo (JP)
Filed by EMD CORPORATION, Yasu (JP); and TOMOEGAWA CORPORATION, Tokyo (JP)
Filed on Apr. 16, 2021, as Appl. No. 17/232,789.
Claims priority of application No. 2020-073436 (JP), filed on Apr. 16, 2020.
Prior Publication US 2021/0327683 A1, Oct. 21, 2021
Int. Cl. H01J 37/32 (2006.01); H01Q 1/36 (2006.01)
CPC H01J 37/32174 (2013.01) [H01Q 1/366 (2013.01); H01J 2237/24564 (2013.01); H01J 2237/3321 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A radio-frequency antenna configured to generate a radio-frequency electromagnetic field in a vacuum container of a plasma processing device, the radio-frequency antenna comprising:
a sheet made of fibers consisting of metal, the sheet being connected to a radio-frequency power source that supplies a radio-frequency current for generating the radio-frequency electromagnetic field.