US 12,353,139 B2
Substrate holder and method of manufacturing a substrate holder
Raymond Wilhelmus Louis Lafarre, Helmond (NL); Sjoerd Nicolaas Lambertus Donders, Vught (NL); Nicolaas Ten Kate, Almkerk (NL); Nina Vladimirovna Dziomkina, Eindhoven (NL); Yogesh Pramod Karade, Eindhoven (NL); and Elisabeth Corinne Rodenburg, Heeze (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Aug. 22, 2023, as Appl. No. 18/453,594.
Application 18/453,594 is a continuation of application No. 17/856,520, filed on Jul. 1, 2022, granted, now 11,754,929.
Application 17/856,520 is a continuation of application No. 17/132,084, filed on Dec. 23, 2020, granted, now 11,376,663.
Application 17/132,084 is a continuation of application No. 15/654,413, filed on Jul. 19, 2017, granted, now 10,875,096.
Application 15/654,413 is a continuation of application No. 15/296,968, filed on Oct. 18, 2016, granted, now 9,737,934.
Application 15/296,968 is a continuation of application No. 14/373,291, granted, now 9,507,274, previously published as PCT/EP2013/050826, filed on Jan. 17, 2013.
Claims priority of provisional application 61/621,648, filed on Apr. 9, 2012.
Claims priority of provisional application 61/621,660, filed on Apr. 9, 2012.
Claims priority of provisional application 61/594,857, filed on Feb. 3, 2012.
Prior Publication US 2024/0027915 A1, Jan. 25, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/00 (2006.01); B05D 3/06 (2006.01); B05D 5/00 (2006.01); B22F 7/06 (2006.01); B22F 10/00 (2021.01); B22F 10/20 (2021.01); B23K 26/342 (2014.01); B23K 26/354 (2014.01); B23Q 3/18 (2006.01); B33Y 10/00 (2015.01); B33Y 80/00 (2015.01); G03F 7/20 (2006.01); B22F 10/25 (2021.01); B22F 10/28 (2021.01); B22F 10/66 (2021.01)
CPC G03F 7/70341 (2013.01) [B05D 3/06 (2013.01); B05D 5/00 (2013.01); B22F 7/062 (2013.01); B22F 10/00 (2021.01); B22F 10/20 (2021.01); B23K 26/342 (2015.10); B23K 26/354 (2015.10); B23Q 3/18 (2013.01); B33Y 10/00 (2014.12); B33Y 80/00 (2014.12); G03F 7/20 (2013.01); G03F 7/70416 (2013.01); G03F 7/707 (2013.01); G03F 7/70708 (2013.01); G03F 7/70716 (2013.01); G03F 7/70733 (2013.01); G03F 7/708 (2013.01); B22F 10/25 (2021.01); B22F 10/28 (2021.01); B22F 10/66 (2021.01)] 20 Claims
OG exemplary drawing
 
8. A holder for use in a lithographic apparatus, the holder comprising:
a main body;
a recess in or on the main body, the recess having one or more openings therein, the one or more openings configured to exhaust fluid; and
a plurality of burls surrounding the recess and having end surfaces to support an object, wherein the burls each comprise a first body protruding portion and a second body protruding portion located further from the main body than the first body protruding portion, wherein the first body portions comprise a different material than the second body portions and wherein the recess is recessed relative to a surface from which the burls extend.