US 12,353,071 B1
Multilayer thin film lithium-containing optical devices
Jeffrey Cole Holzgrafe, Somerville, MA (US); Miles Matthew Kovach, Cambridge, MA (US); Christian Reimer, Wellesley, MA (US); and Mian Zhang, Cambridge, MA (US)
Assigned to HyperLight Corporation, Cambridge, MA (US)
Filed by HyperLight Corporation, Cambridge, MA (US)
Filed on Dec. 20, 2024, as Appl. No. 18/991,092.
Claims priority of provisional application 63/613,580, filed on Dec. 21, 2023.
Int. Cl. G02F 1/035 (2006.01)
CPC G02F 1/035 (2013.01) [G02F 2201/05 (2013.01); G02F 2201/063 (2013.01); G02F 2201/066 (2013.01); G02F 2201/302 (2013.01); G02F 2202/20 (2013.01)] 19 Claims
OG exemplary drawing
 
1. An electro-optic device, comprising:
a substrate structure;
a first layer on the substrate structure and including a first thin film lithium-containing (TFLC) electro-optic material having a first thickness;
a second layer on the first layer, the second layer including a second TFLC electro-optic material and having a second thickness; and
a third layer on the second layer, the third layer including a third TFLC electro-optic material and having a third thickness;
wherein at least one electro-optic structure of the electro-optic device includes the first layer, the second layer, and the third layer, the first layer having a first width in the at least one electro-optic structure, the second layer having a second width in the at least one electro-optic structure, and the third layer having a third width in the at least one electro-optic structure, the at least one electro-optic structure including a waveguide;
wherein a portion of the waveguide is configured with a bend, the third layer being omitted at the bend, a TE0 to TM0 mode conversion being reduced.