| CPC C23C 16/45561 (2013.01) [C23C 16/45519 (2013.01); C23C 16/45544 (2013.01); C23C 16/45563 (2013.01); C23C 16/52 (2013.01); H01J 37/32449 (2013.01)] | 23 Claims |

|
1. A substrate processing apparatus, comprising:
a reaction chamber with an inlet opening;
an in-feed line external to the reaction chamber to provide a reactive chemical into the reaction chamber via the inlet opening;
incoming gas flow control means in the in-feed line, the in-feed line extending from the flow control means to the reaction chamber, the in-feed line in this portion between the flow control means and the reaction chamber having the form of an inlet pipe with a gas-permeable wall, the inlet pipe with the gas-permeable wall extending from the flow control means towards the inlet opening through a volume at least partly surrounding the inlet pipe; and
the apparatus being configured to provide fluid to surround and enter the inlet pipe in said portion.
|