US 12,351,903 B2
Method and system for depositing molybdenum layers
Paul Ma, Scottsdale, AZ (US); Roghayyeh Lotfi, Scottsdale, AZ (US); Jaebeom Lee, Tempe, AZ (US); Eric Christopher Stevens, Tempe, AZ (US); and Amit Mishra, Tempe, AZ (US)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on May 2, 2023, as Appl. No. 18/142,283.
Application 18/142,283 is a division of application No. 17/376,238, filed on Jul. 15, 2021, granted, now 11,674,220.
Claims priority of provisional application 63/054,118, filed on Jul. 20, 2020.
Prior Publication US 2023/0279539 A1, Sep. 7, 2023
Int. Cl. C23C 16/06 (2006.01); C23C 16/30 (2006.01); C23C 16/32 (2006.01); C23C 16/455 (2006.01); C23C 28/00 (2006.01)
CPC C23C 16/06 (2013.01) [C23C 16/303 (2013.01); C23C 16/305 (2013.01); C23C 16/32 (2013.01); C23C 16/45527 (2013.01); C23C 28/341 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A structure comprising a substrate formed by a plurality of steps comprising:
forming an underlayer comprising one or more of a transition metal sulfide, a transition metal carbide, and a transition metal nitride on a surface of the substrate; and
forming a molybdenum layer overlying the underlayer,
wherein the step of forming the underlayer comprises a deposition process, and
wherein the deposition process comprises:
providing a transition metal precursor to a reaction chamber; and
providing one or more of a carbon reactant, a sulfur reactant, and a nitrogen reactant to the reaction chamber, wherein the carbon reactant comprises one or more of acetylene, ethylene, alkyl halide compounds, alkene halide compounds, and metal alkyl compounds.