US 12,351,902 B2
Methods and systems for delivery of vanadium compounds
Charles Dezelah, Helsinki (FI); Qi Xie, Wilsele (BE); Petri Raisanen, Gilbert, AZ (US); Dieter Pierreux, Dilbeek (BE); Bert Jongbloed, Oud-Heverlee (BE); Werner Knaepen, Leuven (BE); and Eric James Shero, Phoenix, AZ (US)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on May 11, 2021, as Appl. No. 17/316,847.
Claims priority of provisional application 63/023,130, filed on May 11, 2020.
Prior Publication US 2021/0348267 A1, Nov. 11, 2021
Int. Cl. C23C 16/02 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01)
CPC C23C 16/02 (2013.01) [C23C 16/4402 (2013.01); C23C 16/45557 (2013.01); C23C 16/45553 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A method, comprising:
delivering vanadium tetrachloride from a bulk supply tank to a delivery vessel as a gas;
after delivering vanadium tetrachloride to the delivery vessel, adding excess chlorine gas to the delivery vessel, thereby mitigating the decomposition of vanadium tetrachloride into decomposition products of the vanadium tetrachloride;
periodically delivering the vanadium tetrachloride from the delivery vessel to a reaction chamber configured for depositing a material and in fluid communication with the delivery vessel; and
sequentially applying the vanadium tetrachloride and a reactant to a substrate disposed in the reaction chamber to form a layer comprising vanadium on the substrate by a cyclical deposition process.