US 12,351,490 B2
High-concentration wastewater treatment device for treating pollutants with strong oxidizing power using plasma
In Ho Lee, Jeollabuk-do (KR); Young Pyo Hong, Jeollabuk-do (KR); and Tae Hun Lee, Jeollabuk-do (KR)
Assigned to GROON CO., LTD., Jeollabuk-Do (KR)
Filed by GROON CO., LTD., Jeollabuk-do (KR)
Filed on Jul. 26, 2022, as Appl. No. 17/873,287.
Claims priority of application No. 10-2022-0079830 (KR), filed on Jun. 29, 2022.
Prior Publication US 2024/0002264 A1, Jan. 4, 2024
Int. Cl. C02F 1/46 (2023.01); C02F 1/72 (2023.01)
CPC C02F 1/4608 (2013.01) [C02F 1/72 (2013.01); C02F 2201/004 (2013.01); C02F 2201/46175 (2013.01)] 5 Claims
OG exemplary drawing
 
1. A high-concentration wastewater treatment device, comprising:
a discharge pin module including a support plate, multiple discharge pins coupled to the support plate, and pin connectors connected to the multiple discharge pins on the support plate and extending upwards;
a discharge plate module spaced apart from the multiple discharge pins; and
a circuit module including a main board, multiple distributed processing boards connected to the main board, a coupling unit which performs a function of connecting the multiple distributed processing boards, and discharge pin connection portions electrically connected to the distributed processing boards in a direction of a lower end of the main board,
wherein the discharge plate module includes a connection pin connected to a lower end of the support plate and a discharge plate accommodation portion coupled to a lower end of the connection pin; and
the discharge pin connection portions have, at their lower ends, coupling grooves into which the pin connectors are inserted, to allow one-touch coupling between the circuit module and the discharge pin module.