US 11,056,365 B2
Fault detection method in semiconductor fabrication facility
Hom-Chung Lin, Taichung (TW); Jih-Churng Twu, Hsinchu County (TW); Chin-Yun Chen, Taipei (TW); Tai-Hsiang Lin, Taichung (TW); and Yu-Chi Tsai, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Nov. 1, 2017, as Appl. No. 15/800,586.
Claims priority of provisional application 62/563,789, filed on Sep. 27, 2017.
Prior Publication US 2019/0096723 A1, Mar. 28, 2019
Int. Cl. H01L 21/67 (2006.01); H01L 21/677 (2006.01); G01N 27/22 (2006.01); G08B 21/18 (2006.01); G08B 25/10 (2006.01); G08B 21/20 (2006.01)
CPC H01L 21/67276 (2013.01) [G01N 27/223 (2013.01); G08B 21/182 (2013.01); G08B 21/20 (2013.01); G08B 25/10 (2013.01); H01L 21/67253 (2013.01); H01L 21/67288 (2013.01); H01L 21/67733 (2013.01); H01L 21/67757 (2013.01); H01L 21/67778 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for fault detection in a fabrication tool, comprising:
processing a semiconductor wafer in a fabrication tool according to a plurality of process events of a process run, wherein the process events correspond to different locations in the fabrication tool;
measuring humidity in the fabrication tool in at least one of the process events by a metrology tool positioned on a transferring member, and recording a location of the metrology tool, wherein the transferring member is moved in the fabrication tool according to the process events;
comparing the humidity measured in one of the process events with an expected humidity associated with the one of the process events;
based on the comparison, indicating an alarm condition which is indicative of a chemical leakage in the fabrication tool when a difference between the measured humidity and the expected humidity exceeds a range of acceptable values associated with the one of the process events, and determining a component that is a source of the chemical leakage;
collecting data associated with humidity in the fabrication tool in each of the process events of a previously executed process run; and
storing the data associated with humidity in an archive database, wherein the expected humidity is derived from the archive database.