US 11,056,319 B2
Apparatus and system having extraction assembly for wide angle ion beam
Costel Biloiu, Rockport, MA (US); Appu Naveen Thomas, Danvers, MA (US); Tyler Rockwell, Wakefield, MA (US); Frank Sinclair, Boston, MA (US); and Christopher Campbell, Newburyport, MA (US)
Assigned to APPLIED Materials, Inc., Santa Clara, CA (US)
Filed by APPLIED Materials, Inc., Santa Clara, CA (US)
Filed on Jul. 29, 2019, as Appl. No. 16/524,646.
Prior Publication US 2021/0035779 A1, Feb. 4, 2021
Int. Cl. H01J 37/32 (2006.01); H01J 37/08 (2006.01)
CPC H01J 37/32541 (2013.01) [H01J 37/08 (2013.01); H01J 37/3255 (2013.01); H01J 37/32422 (2013.01)] 17 Claims
OG exemplary drawing
 
1. An ion beam processing apparatus comprising:
a plasma chamber;
a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture;
a beam blocker, disposed within the plasma chamber and facing the extraction aperture;
a non-planar electrode, disposed adjacent the beam blocker and outside of the plasma chamber;
an extraction plate, disposed outside the plasma plate, and defining a second extraction aperture, aligned with the first extraction aperture; and
an extraction voltage supply, being electrically coupled to bias the extraction plate, the non-planar electrode, and the substrate at a same voltage with respect to the plasma chamber.