US 11,056,316 B2
Radio frequency pulse matching method and device thereof and pulsing plasma generation system
Xiaoyang Cheng, Beijing (CN); Gang Wei, Beijing (CN); Jing Wei, Beijing (CN); Jinzhi Bai, Beijing (CN); and Jing Yang, Beijing (CN)
Assigned to BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
Filed by BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing (CN)
Filed on Dec. 24, 2020, as Appl. No. 17/134,113.
Application 17/134,113 is a continuation of application No. PCT/CN2019/092075, filed on Jun. 20, 2019.
Claims priority of application No. 201810678471.6 (CN), filed on Jun. 27, 2018.
Prior Publication US 2021/0118651 A1, Apr. 22, 2021
Int. Cl. H01J 37/32 (2006.01); H05H 1/46 (2006.01)
CPC H01J 37/32183 (2013.01) [H01J 37/321 (2013.01); H05H 1/46 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A radio frequency (RF) pulse matching method, comprising:
presetting a matching threshold and initializing a pulse count value to a pulse reference value;
loading pulse power to an upper electrode and a lower electrode, the upper electrode including an upper RF power supply and a corresponding upper matching device, and the lower electrode including a lower RF power supply and a corresponding lower matching device;
collecting a pulse signal of the pulse power loaded by the upper RF power supply and calculating a matching parameter of the upper matching device according to the pulse signal;
determining a magnitude of the matching parameter relative to the matching threshold and resetting the pulse count value;
causing of the upper matching device to perform matching on the upper RF power supply or the lower matching device to perform matching on the lower RF power supply according to consistency of the reset pulse count value and the pulse reference value; and
repeating processes until the upper RF power supply and the lower RF power supply are matched.