US 11,056,309 B2
Method and device for implanting ions in wafers
Florian Krippendorf, Jena (DE); and Constantin Csato, Stammbach (DE)
Assigned to MI2-FACTORY GMBH, Jena (DE)
Appl. No. 16/348,800
Filed by mi2-factory GmbH, Jena (DE)
PCT Filed Nov. 27, 2017, PCT No. PCT/EP2017/080526
§ 371(c)(1), (2) Date May 9, 2019,
PCT Pub. No. WO2018/096145, PCT Pub. Date May 31, 2018.
Claims priority of application No. 10 2016 122 791.9 (DE), filed on Nov. 25, 2016.
Prior Publication US 2019/0267209 A1, Aug. 29, 2019
Int. Cl. H01J 37/05 (2006.01); C23C 14/18 (2006.01); C23C 14/48 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/317 (2006.01); H01L 21/04 (2006.01); H01L 29/32 (2006.01); H01L 21/265 (2006.01)
CPC H01J 37/05 (2013.01) [C23C 14/18 (2013.01); C23C 14/48 (2013.01); H01J 37/1472 (2013.01); H01J 37/1477 (2013.01); H01J 37/20 (2013.01); H01J 37/3171 (2013.01); H01L 21/046 (2013.01); H01L 21/0415 (2013.01); H01L 29/32 (2013.01); H01J 2237/024 (2013.01); H01J 2237/0456 (2013.01); H01J 2237/0458 (2013.01); H01J 2237/0475 (2013.01); H01J 2237/057 (2013.01); H01J 2237/1518 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/31701 (2013.01); H01J 2237/31705 (2013.01); H01J 2237/31711 (2013.01); H01J 2237/31713 (2013.01); H01L 21/265 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A device comprising:
a wafer chamber, which comprises a wafer holder, which is configured to hold at least one wafer, and
a filter chamber, which comprises a filter holder and first and second closable openings.