US 11,054,756 B2
Apparatus and method for cleaning reticle stage
Yu-Fu Lin, Hsinchu (TW); Tung-Jung Chang, Hsinchu County (TW); and Chia-Chen Chen, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu (TW)
Filed on Jun. 15, 2020, as Appl. No. 16/902,087.
Application 16/902,087 is a continuation of application No. 15/902,528, filed on Feb. 22, 2018, granted, now 10,684,559, issued on Jun. 16, 2020.
Claims priority of provisional application 62/588,768, filed on Nov. 20, 2017.
Prior Publication US 2020/0310258 A1, Oct. 1, 2020
This patent is subject to a terminal disclaimer.
Int. Cl. G03B 27/42 (2006.01); G03F 7/20 (2006.01); B08B 3/12 (2006.01); B08B 7/02 (2006.01)
CPC G03F 7/70925 (2013.01) [B08B 3/12 (2013.01); B08B 7/028 (2013.01); G03F 7/709 (2013.01); G03F 7/7085 (2013.01); G03F 7/70708 (2013.01); G03F 7/70858 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus for lithography comprising:
a chamber providing a low-pressure environment and having a gas flow controller configured to enable pressurizing or depressurizing the chamber;
an electrostatic reticle holder disposed in the chamber, the electrostatic reticle holder configured to secure a reticle; and
an ultrasound transducer disposed on a side of a mask stage configured to apply ultrasound waves through the mask stage to the electrostatic reticle holder,
wherein the ultrasound waves are configured to dislodge particulate matter from the electrostatic reticle holder.