US 11,053,601 B2
Electroplated Au for conformal coating of high aspect ratio silicon structures
Adam M. Rowen, Livermore, CA (US); Robert K. Grubbs, Albuquerque, NM (US); and Jonathan Joseph Coleman, Albuquerque, NM (US)
Assigned to National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US)
Filed by National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US)
Filed on Oct. 30, 2018, as Appl. No. 16/174,744.
Application 16/174,744 is a division of application No. 14/081,342, filed on Nov. 15, 2013, granted, now 10,147,510.
Prior Publication US 2019/0074100 A1, Mar. 7, 2019
Int. Cl. G21K 1/00 (2006.01); C25D 3/48 (2006.01); G21K 1/06 (2006.01); C25D 17/02 (2006.01); C23C 16/455 (2006.01); C23C 16/18 (2006.01); C25D 7/12 (2006.01); G21K 1/02 (2006.01); C25D 5/18 (2006.01); C23C 16/04 (2006.01)
CPC C25D 3/48 (2013.01) [C23C 16/045 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01); C23C 16/45555 (2013.01); C23C 16/45561 (2013.01); C25D 5/18 (2013.01); C25D 7/123 (2013.01); C25D 17/02 (2013.01); G21K 1/025 (2013.01); G21K 1/06 (2013.01); G21K 2207/005 (2013.01)] 15 Claims
OG exemplary drawing
 
1. An x-ray detector, comprising:
a silicon substrate having gratings with an aspect-ratio of at least 20:1;
an atomic layer deposition (ALD) seed layer formed on the gratings and uniformly and conformally coating the gratings; and
an electroplated metallic layer formed on the seed layer, wherein the electroplated metallic layer is formed of an x-ray absorbing material, and further wherein the electroplated metallic layer uniformly and conformally coats the gratings.