US 11,053,457 B2
Cleaning composition for semiconductor substrate
Shun Aoki, Tokyo (JP); Kan-go Chung, Tokyo (JP); Tomohiro Matsuki, Tokyo (JP); Tatsuya Sakai, Tokyo (JP); Kenji Mochida, Tokyo (JP); and Yuushi Matsumura, Tokyo (JP)
Assigned to JSR CORPORATION, Tokyo (JP)
Filed by JSR CORPORATION, Tokyo (JP)
Filed on Oct. 8, 2019, as Appl. No. 16/595,899.
Application 16/595,899 is a continuation of application No. PCT/JP2018/014804, filed on Apr. 6, 2018.
Claims priority of application No. JP2017-079797 (JP), filed on Apr. 13, 2017.
Prior Publication US 2020/0040282 A1, Feb. 6, 2020
Int. Cl. C11D 3/37 (2006.01); C11D 3/20 (2006.01); C11D 1/00 (2006.01); H01L 21/02 (2006.01)
CPC C11D 3/2082 (2013.01) [C11D 1/008 (2013.01); C11D 3/2079 (2013.01); H01L 21/02057 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A composition for cleaning a semiconductor substrate, comprising:
a novolak resin;
an organic acid not being a polymeric compound; and
a solvent, wherein a solid content concentration of the composition is no greater than 20% by mass, and
the organic acid comprises at least one selected from the group consisting of
acetic acid, propionic acid, butanoic acid, pentanoic acid, hexanoic acid, cyclohexanecarboxylic acid, cyclohexyl acetic acid, 1-adamantanecarboxylic acid, benzoic acid, phenylacetic acid,
difluoroacetic acid, trifluoroacetic acid, pentafluoropropanoic acid, heptafluorobutanoic acid, fluorophenyl acetic acid, difluorobenzoic acid,
10-hydroxydecanoic acid, 5-oxohexanoic acid, 3-methoxycyclohexanecarboxylic acid, camphorcarboxylic acid, dinitrobenzoic acid, nitrophenylacetic acid, lactic acid, glycolic acid, glyceric acid, salicylic acid, anisic acid, gallic acid, furan carboxylic acid,
(meth)acrylic acid, crotonic acid, cinnamic acid, sorbic acid,
oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, dodecanedicarboxylic acid, propanetricarboxylic acid, butanetetracarboxylic acid, cyclohexanehexacarboxylic acid, 1,4-naphthalenedicarboxylic acid, isophthalic acid, terephthalic acid,
difluoromalonic acid, tetrafluorophthalic acid, hexafluoroglutaric acid,
tartaric acid, citric acid, malic acid, tartronic acid, diglycolic acid, iminodiacetic acid,
maleic acid, fumaric acid, and aconitic acid.