US 12,348,092 B2
Method for manufacturing coil
Suguru Nakayama, Kariya (JP); Shunsuke Koyabu, Kariya (JP); Takahisa Kanie, Kariya (JP); and Akinori Hoshino, Kariya (JP)
Assigned to AISIN CORPORATION, Kariya (JP)
Appl. No. 18/030,804
Filed by AISIN CORPORATION, Aichi (JP)
PCT Filed Oct. 6, 2021, PCT No. PCT/JP2021/037050
§ 371(c)(1), (2) Date Apr. 7, 2023,
PCT Pub. No. WO2022/075378, PCT Pub. Date Apr. 14, 2022.
Claims priority of application No. 2020-170049 (JP), filed on Oct. 7, 2020.
Prior Publication US 2023/0378857 A1, Nov. 23, 2023
Int. Cl. C23C 22/00 (2006.01); H02K 15/0421 (2025.01); H02K 15/12 (2006.01)
CPC H02K 15/12 (2013.01) [H02K 15/0421 (2013.01); H02K 2215/00 (2021.08)] 16 Claims
OG exemplary drawing
 
1. A method for manufacturing a coil with an insulating film, comprising:
a preparation step of preparing a formed coil material to which the insulating film has not yet been applied; and
an electrodeposition coating step of generating, with the coil material immersed in an electrodeposition bath, a potential difference between a first electrode connected to the coil material and a second electrode in the electrodeposition bath, wherein
in the electrodeposition coating step, the insulating film is simultaneously applied to a portion of the coil material and another portion of the coil material in such a manner that a film thickness on the portion is thicker than a film thickness on the other portion,
the second electrode has thin film applying electrodes provided around the other portion and a thick film applying electrode that is spaced from the thin film applying electrodes and is provided around the portion and having a first portion that is disposed below the portion in a vertical direction, and second portions that are disposed on both sides in a horizontal direction of the coil material, and
a voltage that is applied to the thick film applying electrode is higher than a voltage that is applied to the thin film applying electrodes.