US 12,347,715 B2
Electrostatic chuck device power supply, electrostatic chuck device, and dechuck control method
Takahiro Tsuchiya, Hamamatsu (JP)
Assigned to HAMAMATSU PHOTONICS K.K., Hamamatsu (JP)
Appl. No. 17/801,586
Filed by HAMAMATSU PHOTONICS K.K., Hamamatsu (JP)
PCT Filed Dec. 23, 2020, PCT No. PCT/JP2020/048193
§ 371(c)(1), (2) Date Aug. 23, 2022,
PCT Pub. No. WO2021/176815, PCT Pub. Date Sep. 10, 2021.
Claims priority of application No. 2020-035316 (JP), filed on Mar. 2, 2020.
Prior Publication US 2023/0133839 A1, May 4, 2023
Int. Cl. H01L 21/683 (2006.01)
CPC H01L 21/6833 (2013.01) 19 Claims
OG exemplary drawing
 
1. A power supply for an electrostatic chuck device, comprising:
a voltage application unit configured to apply a dechuck voltage that is used when dechucking an object to be held to a first electrode and a second electrode,
the dechuck voltage being constituted by a first AC voltage applied to the first electrode in a first waveform, and a second AC voltage applied to the second electrode in a second waveform having a phase difference from the first waveform,
wherein the voltage application unit stops application of the dechuck voltage to the first electrode and the second electrode on the basis of information on timing at which the first waveform and the second waveform intersect each other.