US 12,347,711 B2
Gas diffusion device, and wafer container including the same
Ming-Chien Chiu, New Taipei (TW); Chia-Ho Chuang, New Taipei (TW); Kuo-Hua Lee, New Taipei (TW); Shu-Hung Lin, New Taipei (TW); and Hao-Kang Hsia, New Taipei (TW)
Assigned to GUDENG PRECISION INDUSTRIAL CO., LTD., New Taipei (TW)
Filed by GUDENG PRECISION INDUSTRIAL CO., LTD., New Taipei (TW)
Filed on Aug. 8, 2022, as Appl. No. 17/882,703.
Claims priority of provisional application 63/316,391, filed on Mar. 3, 2022.
Claims priority of provisional application 63/284,105, filed on Nov. 30, 2021.
Claims priority of provisional application 63/233,878, filed on Aug. 17, 2021.
Prior Publication US 2023/0054753 A1, Feb. 23, 2023
Int. Cl. H01L 21/673 (2006.01)
CPC H01L 21/67389 (2013.01) 31 Claims
OG exemplary drawing
 
1. A gas diffusion device, installed in a wafer container having an accommodating space, the gas diffusion device comprising:
a buffering gas chamber, configured at a bottom portion of the wafer container, the bottom portion provided with at least one coupling structure, the coupling structure defining a through channel having a center axis, the buffering gas chamber having at least one gas intake channel, the gas intake channel, the buffering gas chamber, the through channel and the accommodating space communicating with one another; and
at least one porous tube, having a longitudinal space, the porous tube installed to the coupling structure of the wafer container, the longitudinal space of the porous tube communicating with the buffering gas chamber, the buffering gas chamber providing a gas to pass through the porous tube and enter the accommodating space, a gas intake center axis of the gas and a center axis of the coupling structure being coaxial.