US 12,347,699 B2
Supply tank, supply device and supply system
Masaaki Furuya, Yokohama (JP); Hiroaki Kobayashi, Yokohama (JP); and Hideki Mori, Yokohama (JP)
Assigned to SHIBAURA MECHATRONICS CORPORATION, Yokohama (JP)
Filed by SHIBAURA MECHATRONICS CORPORATION, Yokohama (JP)
Filed on Sep. 12, 2022, as Appl. No. 17/942,520.
Claims priority of application No. 2021-148834 (JP), filed on Sep. 13, 2021.
Prior Publication US 2023/0077617 A1, Mar. 16, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01L 21/67 (2006.01)
CPC H01L 21/6708 (2013.01) 7 Claims
OG exemplary drawing
 
1. A supply tank that supplies a process liquid to a substrate processing device comprising:
a container that stores the process liquid;
a first dividing plate that divides the container into a first region and a second region, collect piping being connected to the first region, the collect piping collecting the process liquid from the substrate processing device after processing of a substrate, the process liquid being introduced into the first region from the substrate processing device via the collect piping, the second region supplying the process liquid to the substrate processing device;
first piping that feeds, to the second region, the process liquid introduced in the first region;
a first heater which is provided on a path through the first piping, and which heats the process liquid; and
a second dividing plate that divides the second region into a third region where the process liquid is fed from the first piping, and a fourth region that supplies the process liquid to the substrate processing device,
wherein:
the first dividing plate is provided on one side of the container to which the end of the first dividing plate is connected, and is provided with an opening which causes the first region and the second region to be in communication with each other; and
the second dividing plate is provided at an other side-surface side that is an opposite side to the one side surface of the container, and is provided with an opening which causes the third region and the fourth region to be in communication with each other.